Hafnium nitride; hafnium nitride HfN

Properties: Grey powder, cubic crystal structure

Melting point 3310℃

Microhardness 16GPa

Molecular weight: 192.50

Density/(g/cm3) : 10.85/cm3

Specific heat capacity /[J/ (kg.K)] : 209.2

Thermal conductivity /[W/ (m.K)] : 11.715

It is quite stable, but easy to be corroded by aqua regia, concentrated sulfuric acid and hydrofluoric acid. With high purity, small particle size, uniform distribution, large specific surface area, high surface activity, gray powder, cubic crystal structure. Microhardness 16GPa. It is produced by the direct reaction of hafnium and nitrogen at 900 ° C, or by the reaction of hafnium halides with ammonia or nitrogen and hydrogen. It is an important component of hafnium alloy, an important refractory compound.

Product Application:

Hafnium nitride has excellent mechanical, electrical, optical, high temperature resistance and corrosion resistance, and has very important applications in mechanical manufacturing and microelectronics. Nanometer hafnium nitride can be widely used in many fields such as semiconductor, optoelectronics and machining. Nanometer hafnium nitride film is expected to be an efficient anti-reflection coating material for optical window due to the integration of a variety of excellent mechanical, thermal, optical and wear resistance properties, which can be applied to key optical devices in aerospace. HfN is a new type of hard material with high melting point, high hardness, wear resistance and oxidation resistance, which can be used as a protective layer in technical and decorative fields, an anti-wear outer film of tools, and a chemically inert film and a protective film with high temperature resistance.