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Cobalt Silicide, CoSi2
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Cobalt Silicide, CoSi2

Cobalt silicide

Chemical formula: CoSi2

Molecular weight: 115.104

CAS number: 12017-12-8

EINECS number: 234-616-8

Density: 5.3g/cm3

Melting point: 1277 ℃

Lattice constant: a=0.535nm

Crystal system: Cubic crystal system

Appearance: Gray silicide ceramic powder

Solubility: insoluble in water

Nature and stability: If used and stored according to specifications, it will not decompose. CoSi2 can react with hot hydrochloric acid, soluble in hydrochloric acid but insoluble in sulfuric acid. It can be corroded by aqua regia, concentrated nitric acid, strong alkaline solutions, and molten hydroxide and carbonate bases. It can undergo chemical reactions with hydrogen sulfide, hydrogen fluoride, hydrogen chloride, fluorine, chlorine, etc. Synthesis method: Mix cobalt powder and silicon powder evenly according to the chemical composition ratio of CoSi2, melt them under air isolation conditions, and keep them at a temperature of 1150 ℃ for 100 hours to fully homogenize them. The product is nearly a single phase of CoSi2. Purpose: Cobalt silicide powder has the characteristics of low resistivity and good thermal stability, and is mainly used for large-scale integrated circuits. In addition, cobalt silicide has a crystal structure similar to silicon, which allows for the formation of epitaxial CoSi2/Si structures on silicon substrates, To study the interface characteristics of epitaxial metal silicon.Cobalt silicide (cosix) is a widely used material for the connection of metals and semiconductors, and it works in the device as an inter-connect between the base electrode of the semiconductor and the metal wire.
Storage method: Keep in dry, cool environment, should not be exposed to the air, prevent moisture oxidation agglomeration, affect the dispersion performance and use effect.

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